Overview of Tube Furnace

A tube furnace is a type of laboratory equipment used for high-temperature applications, featuring a cylindrical heating chamber designed to heat samples uniformly along its length. Commonly used in material processing, chemical analysis, and semiconductor manufacturing, it supports processes like annealing, sintering, and calcination.

Features of Tube Furnace

Uniform Heating: Ensures even temperature distribution throughout the sample.

Cylindrical Design: Facilitates consistent heating by minimizing hot spots.

Temperature Range: Capable of achieving high temperatures suitable for various processes.

Programmable Controls: Allows for precise control over heating cycles and profiles.

Gas Flow Control: Supports controlled atmosphere environments for specific reactions.

Compact and Efficient: Designed for efficient operation with minimal footprint.

(laboratory vacuum Quartz tube chamber furnace for calcining or annealing semiconductor wafers VBF-1200X-H8)

Specification of laboratory vacuum Quartz tube chamber furnace for calcining or annealing semiconductor wafers VBF-1200X-H8

The VBF-1200X-H8 laboratory vacuum cleaner quartz tube chamber heater is made for calcining or annealing semiconductor wafers. It combines innovative heating modern technology with a durable quartz tube framework. The heater operates in high-temperature settings, attaining uniform thermal circulation for exact processing. The quartz tube chamber makes sure chemical inertness, minimizing contamination risks throughout semiconductor treatment.

The heater reaches an optimum temperature of 1200 ° C, managed by means of a programmable interface. Customers readjust heating rates, hold times, and cooling down cycles with high accuracy. The system includes a vacuum pump to preserve low-pressure conditions, critical for preventing oxidation or undesirable responses. A sealed chamber design sustains inert gas atmospheres when required.

Heating elements border the quartz tube, supplying constant power transfer. Thermal insulation products minimize heat loss, boosting energy performance. The chamber suits several wafer sizes, with optional components for securing samples. A viewing home window permits visual tracking without disrupting internal problems.

Security features consist of over-temperature protection, automated closure, and emergency air conditioning. Alerts notify customers of stress inconsistencies or system errors. The structure uses stainless-steel framing, ensuring stability under extreme temperatures. Maintenance is simplified with accessible elements and modular layout.

The VBF-1200X-H8 fits research study laboratories and small manufacturing. Applications include thin-film annealing, nanoparticle synthesis, and ceramic processing. Compatibility with harsh gases broadens its usage in specialized material researches. Customers incorporate the heater with external controllers for information logging or remote procedure.

Customized setups support specific wafer dimensions or process demands. Options consist of updated vacuum pumps, added gas inlets, or enhanced air conditioning systems. The heater satisfies sector criteria for temperature harmony and procedure repeatability. Technical assistance provides calibration assistance and repairing help.

Running the system needs conventional electrical links and gas supply arrangements. Training products detail arrangement procedures and safety protocols. The portable impact fits common lab spaces, minimizing setup intricacy. Resilience ensures long-lasting efficiency under frequent thermal biking.

(laboratory vacuum Quartz tube chamber furnace for calcining or annealing semiconductor wafers VBF-1200X-H8)

Applications of laboratory vacuum Quartz tube chamber furnace for calcining or annealing semiconductor wafers VBF-1200X-H8

The lab vacuum quartz tube chamber furnace VBF-1200X-H8 is made for calcining and annealing semiconductor wafers. This equipment plays a vital role in semiconductor production. It makes sure precise thermal processing under regulated vacuum problems. The quartz tube chamber uses high thermal resistance. It maintains chemical inertness. This avoids contamination of delicate products throughout high-temperature operations.

Semiconductor wafers require consistent heating to attain optimum electric residential properties. The VBF-1200X-H8 delivers constant temperature level circulation across the chamber. Its sophisticated heating elements make it possible for fast temperature level ramping. This reduces handling time. The vacuum cleaner environment gets rid of oxidation threats. It protects wafer integrity throughout annealing or calcining.

The furnace operates within a temperature level variety of up to 1200 ° C. Users readjust criteria by means of an user-friendly control user interface. Real-time monitoring systems track temperature and pressure. Alerts turn on if discrepancies occur. This minimizes mistakes. Safety features consist of automated shut-off and overheat protection. These protect against damage to samples and devices.

High-purity quartz materials make certain long-lasting resilience. Television withstands thermal shock. It endures repeated home heating cycles. Upkeep is straightforward. Individuals access the chamber easily for cleansing or sample handling. The small design conserves area in labs. It fits typical workstations.

Research study institutions and commercial facilities depend on this heating system for creating innovative semiconductors. It sustains thin-film deposition processes. It aids in evaluating new materials under severe conditions. Personalized setups accommodate diverse experiment demands. Customers procedure several wafers in a single set. This boosts productivity.

The VBF-1200X-H8 fulfills stringent industry requirements. Its integrity makes it ideal for continual operation. Energy-efficient elements reduce power intake. Functional prices remain low. Technical assistance is readily available for troubleshooting. Service plans expand tools life-span.

Semiconductor manufacturers prioritize precision and repeatability. This heating system makes certain both. It deals with fragile procedures without jeopardizing wafer quality. Its performance supports advancement in electronic devices and nanotechnology. Customers attain regular outcomes throughout manufacturing cycles.

Company Introduction

Welcome to Designerstudiostore, your premier source for high-quality industrial furnaces designed to meet the stringent demands of modern manufacturing. Our extensive range includes electric, gas, and oil-fired furnaces tailored for various applications such as heat treatment, forging, and laboratory use. With cutting-edge technology and innovative designs, we ensure energy efficiency and superior performance in every product. At Designerstudiostore, we prioritize customer satisfaction by offering customized solutions, reliable after-sales support, and seamless global delivery options. Explore our catalog and discover why businesses worldwide trust us for their heating needs.

If you have any questions, please feel free to contact us(nanotrun@yahoo.com).

Payment Methods

T/T, Western Union, Paypal, Credit Card etc.

Shipment Methods

By air, by sea, by express, as customers request.

5 FAQs of laboratory vacuum Quartz tube chamber furnace for calcining or annealing semiconductor wafers VBF-1200X-H8

1. What temperature range does the VBF-1200X-H8 furnace cover? The furnace operates between 200°C and 1200°C. This range suits calcining and annealing semiconductor wafers. The temperature control system ensures precise adjustments. Uniform heating across the quartz tube chamber prevents material damage. Advanced heating elements and insulation maintain stability.

2. How fast can the furnace heat up or cool down? The heating rate reaches 20°C per minute. Users adjust speeds based on material requirements. Cooling depends on settings. Natural cooling takes longer. Forced cooling with inert gas speeds the process. Safety limits prevent sudden temperature drops.

3. What vacuum levels does the chamber support? The vacuum system achieves 10^-3 Torr. A rotary vane pump creates low pressure. This minimizes oxidation during high-temperature processes. Leak-proof seals maintain vacuum integrity. Real-time pressure monitoring ensures consistency.

4. Is the quartz tube resistant to thermal stress? The tube uses high-purity fused quartz. It handles rapid temperature changes without cracking. Maximum continuous operating temperature is 1200°C. Chemical resistance protects against acidic or corrosive atmospheres. Regular inspections prevent micro-fractures.

5. What safety features are included? Over-temperature protection shuts off power automatically. Pressure sensors detect vacuum failures. Emergency venting releases gas buildup. An alarm system alerts users to malfunctions. The chamber door locks during operation. Safety certifications meet industrial laboratory standards.

(laboratory vacuum Quartz tube chamber furnace for calcining or annealing semiconductor wafers VBF-1200X-H8)